Electrolytic copper plating device (non-dissolving copper plating)
We would like to introduce a device that performs copper plating treatment on the product pattern section using a vertical transport method.
The device can perform copper plating on the product pattern section. The process involves pre-treatment of the film foil, copper plating, rinsing, and drying, and is carried out in a roll-to-roll vertical transport method for both sides of the product. The reference dimensions of the device, excluding the control panel and ancillary equipment, are 20m (L) × 4.6m (W) × 4.4m (H). 【Specifications】 ■Lane configuration: 1 Lane ■Transport speed: 1.0m/min ■Material width: MAX 300mm ■Material thickness: 25μm to 50μm ■Processing surface: Both sides *For more details, please refer to the PDF document or feel free to contact us.
- Company:SETO ENGINEERING 守谷事業所
- Price:Other